Mist ieee dce

Is there any Facebook page for MIST IEEE DCE getting information regarding to
Troika festival, what are events conducted in DCE Troika & every year on which date DTU conducts Troika festival???

Hello sir, Im student of Mahaveer Institute of Science and Technology I want IEEE DCE paper. Is there any one can provide me IEEE DCE paper for Mahaveer Institute of Science and Technology?

[pawan]

IEEE papers are giving an idea to make a project report in specific topic. Mahaveer Institute of Science and Technology may collect IEEE papers from IEEE official.

The IEEE MIST Student Branch is working under IEEE Bangladesh section of IEEE Region 10, referred as the Asia Pacific Region.

It is registered in IEEE on March 26, 2014 under the dept. of EECE.

Even being a relatively newer branch IEEE MIST SB has made its name in IEEE BDS arena and proclaimed the best promising student branch award of 2015 in Bangladesh.

For IEEE DCE application in oxide furnace candidates need to login in IEEE for purchase paper.

Get info about IEEE DCE paper for Mahaveer Institute of Science and Technology:
hieeexplore.ieee.org/document/7464019/?part=1

DCE application in oxide furnace
Authors
Yinglai Guan
Shanghai Jiao Tong University, Shanghai, China

Overview:

Date of Conference: 13-14 March 2016
Date Added to IEEE Xplore: 05 May 2016

INSPEC Accession Number: 15986603
DOI: 10.1109/CSTIC.2016.7464019
Publisher: IEEE
Conference Location: Shanghai, China

References:

1. Kong-soo Lee, Gyeonggi-do (KR), Jae-jong Hang, (KR) Seoul, Sung-eui Kim, Gyeonggi-do, "Methods Of For Ming Gate Oxide Films In Integrated Circuit Devices Using Wet Or Dry Oxidation Processes With Reduced Chloride", Apr. 2004.

2. K. Hirabayashi, J. Iwamura, "Kinetics of Thermal Growth of HCL-SiO2 Oxides on Silicon", Journal of The Electrochemical Society. Soc, vol. 120, no. 11, pp. 1595-1601, 1973. CrossRef Google Scholar

3. M. Quirk, J. Serda, "Semiconductor Manufacturing Technilogy", pp. 26-27.

4. L. Peters, "Thermal Processing's Tool of Choice: Single Wafer RTP or Fast Ramp Batch?", Semiconductor International, April 1998.

5. Yu Wang, Nishioka Yasushiro, T.P. Ma, R.C., "Radiation and Hot-Electron Hardness of SiO2/Si Grown In 02 With Trichloroethane Additive", Apr 1988.